About us  
Gather glimmers to light up the future
Technical advantages
Advanced technology

1、Enhanced FSI Pixel                                           2、Large Scale Stitching Process
High Light Transmittance DT (95%) vs NDC Removal (92%) Decreased Mask Consumption (41 -> 33 layers)

Stitched Full Frame 36*24mm 24M Pixels CIS on 12-inch wafer

Large Scale Stitching applied to FEOL: NW, SDN, SDP, AA, Poly BEOL: All Metal, Via 55nm Stitching Technology with absolute precision of 5nm (<10%)

3、BSI （背照技术） Pixel
QE &SNR improvement
Low cross talk
Excellent SNR
4、3D Stacked BSI (under development)
Large Scale Stitching applied to
                  FEOL: NW, SDN, SDP, AA, Poly
                  BEOL: All Metal, Via
Company Office Number：
028-68669333
Company Email：
imgds@imagedesign.com​.cn
Company address：
9-10F, Unit 2, Building B6, No. 171, Hele Second Street, High tech Zone, Chengdu

301, Floor 3, Sanda Science and Technology Building, No. 1, Keji Road, Nanshan District, Shenzhen